Deposição de filmes finos de nitreto titânio através de nitretação à plasma em amostras de vidro utilizando gaiola catódica

Abstract

Nitriding is a common thermochemical treatment process for increasing surface hardness and wear resistance, and thus a process that offers many advantages industrially. The ionic nitriding came to offer more speed and less time in the treatment of a part, thus being possible to add various materials because of the low treatment temperature, and speed. With the advancement of technologies, improvements were made in the nitriding process to avoid edge effects, overheating, and layer uniformity. With this the technique of cathodic cage plasma nitriding was introduced, where the plasma drew electrons from the cage, which combined with other reactive elements are deposited on the substrate at fluctuating potential. The optical properties of TiN can have great use in solar plates as infrared filters. The present work presents a literature review on the analysis of the efficiency of the cathodic cage nitriding technique in performing Titanium Nitride (TiN) depositions and its influences on glass samples. Articles, dissertations and thesis were read about the thermochemical treatments with certain temperatures, modifications in the cage and in specific pressure and duration conditions. The analyses in which the samples were characterized and compared according to their treatment conditions were highlighted. The results obtained from these tests proved the deposition of a thin TiN film in all treatment conditions, proving the efficiency and great versatility of this deposition technique.