Deposição de dióxido de titânio (TiO2) em aço duplex por gaiola catódica: influência H2/Ar

Abstract

This study aimed to deposit thin films of titanium dioxide (TiO2) in duplex stainless steel substrate by cathodic deposition technique cage. The choice was motivated by this technique possible surface treatment at a lower temperature and eliminates defects that occur often at high temperatures in this process as well, coating a large variety of substrates. In the production of the film was used as a cage titanium target was set in a continuous voltage DC plasma chamber and the interior of the cage was placed duplex stainless steel substrate. The treatment temperature was held constant at 450°C so that it could evaluate the influence of the atmosphere (H2/Ar) in the film production process. For the characterization of the TiO2 film was used Raman spectroscopy and X-ray diffraction grazing angle in addition to corrosion tests. The results indicated that ratio H2/Ar affect the crystallinity and protective capacity of the film among others.