Deposição a plasma de nitreto de titânio: análise comparativa das técnicas cátodo oco e gaiola catódica

Abstract

The thin film deposition using physical vapor deposition method (PVD) enhaced by plasma is widely studied for technological applications aiming at large scale use. The deposition of thin films, arises interest to get improvements in mechanical, optical, electrical and tribological properties of the substrate, among others. The deposition by reactive sputtering methods using the techniques like the hollow cathode and cathodic cage has demonstrated many benefits over conventional processes, for example, low cost in the coating which requires a relatively simple system. With the aim to study surfaces of commercially pure titanium (Grade II) modified by titanium nitride by sputtering techniques like hollow cathode and the cathodic cage using different the deposition time, we figured the best results on this substrate. The samples were characterized through the techniques like Raman spectroscopy, scanning electron microscopy (SEM), Energy Dispersive Spectroscopy (EDS) and roughness. Based on these results, the properties of the thin films were evaluated as topography, presence of interstitial elements, roughness, homogeneity and uniformity of the deposited layer, in order to determine the best deposition method. It was found that in cathodic treatment cage, produced higher roughness values between treated samples and showed the most successful treatment to coat the substrate using the best conditions to obtain TiN coatings.