Deposição de TiN em substrato de Ti: comparação entre as técnicas cátodo oco e gaiola catódica

Abstract

Plasma deposition processes have been used in industrial and technological applications on a large scale by presenting an improvement in the mechanical, optical, electrical, among others. The deposition methods via the hollow cathode and cathodic cage has demonstrated a number of advantages over conventional processes such as reduction and removal of the rings caused by the edge effect. In the present study, we studied surfaces of commercially pure titanium (Grade II), modified by the deposition of titanium nitride on the surface by altering the time variable, in order to obtain an optimization of the surface for technological applications, which generally evaluated treatment showed better results in the substrate. The samples were characterized by Raman spectroscopy technique. It was observed that all the samples exposed to treatment were modified (With the exception of samples CO120, CO240, GC120 and GC240 showed that soot impossible characterization) in relation to the standard sample (no treatment), showing the presence of TiN, found in the Raman. Through analysis it was found that the films deposited by cathodic cage technique are more homogeneous, since the coated hollow cathode samples via a variation of TiN ratio over the sample caused by the edge effect showing heterogeneity thus proving that the best technique to use is to deposit in the cage Cathodic.